I’m pleased to present our {1064 Diode Laser Hair Removal Machine 808nm}, built for clinics and multi-site aesthetic chains that demand reliability and growth-ready capability. I designed it with a focus on efficiency, safe operation, and low maintenance, so OEM partners can scale without delays. For Companies seeking branding flexibility, we offer OEM packaging, labeling, and private-label options, plus tailored firmware settings to match your clinical protocols. The device delivers consistent energy, fast treatment cycles, and gentler patient experiences, backed by a robust cooling system and proven safety features. I also provide comprehensive documentation, service support, and readily available spare parts to minimize downtime. For procurement teams, the value is clear: shorter ROI, predictable performance, and the ability to meet diverse skin types and hair colors. This listing includes company detail: {} and collaborative terms that align with your purchasing processes. Let’s discuss volume pricing, lead times, and after-sales service to fit your Companies’ expansion plans.
In the evolving field of aesthetic technology, a diode laser platform blends 1064 nm and 808 nm wavelengths to deliver efficient hair reduction across a wide range of skin tones. Designed for clinics and medspas worldwide, it combines proven efficacy with safety through precise energy delivery and targeted follicle treatment. Key specs include high pulse energy, adjustable pulse duration, fast repetition rates, and an effective cooling system to maximize comfort. Intuitive controls and preset protocols support consistent results and allow optional modules for skin treatments, expanding service offerings for diverse markets. For global buyers, reliable supply and responsive service matter as much as performance. Seek partners with scalable production, readily available spare parts, multilingual support, and transparent logistics. A dependable platform enables higher client throughput and steady returns across regions.
| Model ID | Wavelength (nm) | Pulse Duration (ms) | Repetition Rate (Hz) | Spot Size (mm) | Peak Power (W) | Energy per Pulse (J) | Cooling System | Certification | Treatment Area (cm²) |
|---|---|---|---|---|---|---|---|---|---|
| M-101 | 1064 | 12 | 1.5–2 | 12 | 700 | 8.4 | Sapphire-assisted contact cooling | CE | 1.13 |
| M-102 | 808 | 12 | 1–2 | 10 | 650 | 7.8 | Water-cooled | CE | 0.79 |
| M-103 | 1064 | 7 | 1–3 | 12 | 900 | 6.3 | Peltier + sapphire | CE, RoHS | 1.13 |
| M-104 | 808 | 10 | 2 | 9 | 600 | 6.0 | Diode array + air cooling | CE | 0.64 |
| M-105 | 1064 | 6 | 1 | 14 | 750 | 4.5 | Water-cooled | CE, ISO 13485 | 1.54 |
| M-106 | 1064 | 15 | 1 | 10 | 550 | 8.25 | Sapphire-assisted | CE | 0.79 |
| M-107 | 808 | 3 | 1–2 | 8 | 1200 | 3.6 | Peltier | CE | 0.50 |
| M-108 | 1064 | 20 | 0.5–1 | 12 | 500 | 10.0 | Water + air | CE | 1.13 |
| M-109 | 808 | 18 | 0.5–1 | 11 | 650 | 11.7 | Cryogen spray + water-cooled | CE | 0.95 |
| M-110 | 1064 | 9 | 2 | 9 | 800 | 7.2 | Water-cooled | CE, ISO 13485 | 0.64 |